Abstract
The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.
Original language | English |
---|---|
Pages | I186-I187 |
Publication status | Published - 2001 Dec 1 |
Event | 4th Pacific Rim Conference on Lasers and Electro-Optics - Chiba, Japan Duration: 2001 Jul 15 → 2001 Jul 19 |
Other
Other | 4th Pacific Rim Conference on Lasers and Electro-Optics |
---|---|
Country/Territory | Japan |
City | Chiba |
Period | 01/7/15 → 01/7/19 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering