Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Research output: Contribution to conferencePaperpeer-review

2 Citations (Scopus)

Abstract

The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.

Original languageEnglish
PagesI186-I187
Publication statusPublished - 2001 Dec 1
Event4th Pacific Rim Conference on Lasers and Electro-Optics - Chiba, Japan
Duration: 2001 Jul 152001 Jul 19

Other

Other4th Pacific Rim Conference on Lasers and Electro-Optics
Country/TerritoryJapan
CityChiba
Period01/7/1501/7/19

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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