Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Kazuhiro Hane; Yoshiaki Kanamori

Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Research output: Contribution to conference › Paper › peer-review

Abstract

The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.

Original language	English
Pages	I186-I187
Publication status	Published - 2001 Dec 1
Event	4th Pacific Rim Conference on Lasers and Electro-Optics - Chiba, Japan Duration: 2001 Jul 15 → 2001 Jul 19

Other

Other	4th Pacific Rim Conference on Lasers and Electro-Optics
Country/Territory	Japan
City	Chiba
Period	01/7/15 → 01/7/19

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

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title = "Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching",

abstract = "The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.",

author = "Kazuhiro Hane and Yoshiaki Kanamori",

year = "2001",

month = dec,

day = "1",

language = "English",

pages = "I186--I187",

note = "4th Pacific Rim Conference on Lasers and Electro-Optics ; Conference date: 15-07-2001 Through 19-07-2001",

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TY - CONF

T1 - Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

AU - Hane, Kazuhiro

AU - Kanamori, Yoshiaki

PY - 2001/12/1

Y1 - 2001/12/1

N2 - The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.

AB - The fabrication of subwavelength structured (SWS) surfaces with 100 nm order period gratings on Si and GaAlAs subtrates was done by the fast atom beam (FAB) etching combined with electron beams (EB). Smooth tapered gratings with high aspect ratio were fabricated. The reflectivities of fabricated SWS surfaces were found to decrease drastically in the visible wave length.

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UR - http://www.scopus.com/inward/citedby.url?scp=0035693121&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0035693121

SP - I186-I187

T2 - 4th Pacific Rim Conference on Lasers and Electro-Optics

Y2 - 15 July 2001 through 19 July 2001

ER -

Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Abstract

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ASJC Scopus subject areas

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