Sub-15nm hard X-ray focusing with a new total-reflection zone plate

Hidekazu Takano, Takuya Tsuji, Takuto Hashimoto, Takahisa Koyama, Yoshiyuki Tsusaka, Yasushi Kagoshima

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)


A new total-reflection zone plate that consists of a reflective zone pattern with varied-space on a flat substrate was fabricated for hard X-ray nanofocusing. This device is much easier to fabricate than other focusing devices. This is because its focusing size is much smaller than its finest constituent structure since it exploits the effect of glancing X-rays by having a small total reflection angle. Its focusing properties were evaluated using 10-keV X-rays and a focusing size of 14.4 nm was achieved.

Original languageEnglish
Article number076702
JournalApplied Physics Express
Issue number7
Publication statusPublished - 2010 Jul
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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