Sub-μm wide channels with surface potential compensated by focused Si ion beam implantation

Toshimasa Fujisawa, Tadashi Saku, Yoshiro Hirayama, Seigo Tarucha

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We propose and demonstrate a novel technique using focused Si ion beam implantation to produce high-quality mesoscopic channels. Low-energy Si implantation compensates the surface potential of a modulation-doped heterostructure that is designed to have no conductive channels at the heterointerface. The implantation forms a conductive channel separated from the damaged implanted region. The mobility of the channel is improved by decreasing the ion energy from 100 to 35 keV. Sub-μm to 5 μm wide channels fabricated by 35 keV Si+ ions show a mobility of 5.3×105 cm2/V s and a ballistic length of 3.1 μm at 1.5 K.

Original languageEnglish
Pages (from-to)51-53
Number of pages3
JournalApplied Physics Letters
Volume63
Issue number1
DOIs
Publication statusPublished - 1993
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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