TY - JOUR
T1 - Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2thin film on Ir electrode
AU - Shimizu, Takao
AU - Yokouchi, Tatsuhiko
AU - Shiraishi, Takahisa
AU - Oikawa, Takahiro
AU - Rama Krishnan, P. S.Sankara
AU - Funakubo, Hioshi
N1 - Publisher Copyright:
© 2014 The Japan Society of Applied Physics.
PY - 2014/10/1
Y1 - 2014/10/1
N2 - The effect of the heat treatment conditions on the constituent phases and electrical properties of (Hf0.5Zr0.5)O2films deposited by the metalorganic chemical vapor deposition was investigated. By using a low temperature or short duration for post-heat treatment after the deposition, the volume fraction of the tetragonal phase increases, resulting in a high dielectric constant. On the other hand, the volume fraction of the monoclinic phase increased in the films that were heat-treated at higher temperatures and exposed to longer heat treatment duration. The ferroelectric with and dielectric properties of these films were greatly inferior. Superior ferroelectric properties a significant volume fraction of orthorhombic phase were achieved for intermediate heat treatment conditions. These results give useful information to understand the origin of the ferroelectricity and to control the phases and electrical properties in HfO2-based films.
AB - The effect of the heat treatment conditions on the constituent phases and electrical properties of (Hf0.5Zr0.5)O2films deposited by the metalorganic chemical vapor deposition was investigated. By using a low temperature or short duration for post-heat treatment after the deposition, the volume fraction of the tetragonal phase increases, resulting in a high dielectric constant. On the other hand, the volume fraction of the monoclinic phase increased in the films that were heat-treated at higher temperatures and exposed to longer heat treatment duration. The ferroelectric with and dielectric properties of these films were greatly inferior. Superior ferroelectric properties a significant volume fraction of orthorhombic phase were achieved for intermediate heat treatment conditions. These results give useful information to understand the origin of the ferroelectricity and to control the phases and electrical properties in HfO2-based films.
UR - http://www.scopus.com/inward/record.url?scp=84908092541&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84908092541&partnerID=8YFLogxK
U2 - 10.7567/JJAP.53.09PA04
DO - 10.7567/JJAP.53.09PA04
M3 - Article
AN - SCOPUS:84908092541
VL - 53
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 9
M1 - 09PA04
ER -