Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2thin film on Ir electrode

Takao Shimizu, Tatsuhiko Yokouchi, Takahisa Shiraishi, Takahiro Oikawa, P. S.Sankara Rama Krishnan, Hioshi Funakubo

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51 Citations (Scopus)

Abstract

The effect of the heat treatment conditions on the constituent phases and electrical properties of (Hf0.5Zr0.5)O2films deposited by the metalorganic chemical vapor deposition was investigated. By using a low temperature or short duration for post-heat treatment after the deposition, the volume fraction of the tetragonal phase increases, resulting in a high dielectric constant. On the other hand, the volume fraction of the monoclinic phase increased in the films that were heat-treated at higher temperatures and exposed to longer heat treatment duration. The ferroelectric with and dielectric properties of these films were greatly inferior. Superior ferroelectric properties a significant volume fraction of orthorhombic phase were achieved for intermediate heat treatment conditions. These results give useful information to understand the origin of the ferroelectricity and to control the phases and electrical properties in HfO2-based films.

Original languageEnglish
Article number09PA04
JournalJapanese journal of applied physics
Volume53
Issue number9
DOIs
Publication statusPublished - 2014 Oct 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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