Study on Rf Magnetron Discharges of Oxygen/Argon Mixture by the Particle-in-cell/Monte Carlo Method

S. Yonemura, K. Nanbu

Research output: Contribution to journalConference articlepeer-review


The characteristics of rf planar magnetron discharges of O2/Ar mixture are clarified using the Particle-in-Cell/Monte Carlo (PIC/MC) method. The simulation is carried out for axisymmetrical magnetic fields. The spatial and temporal behavior of magnetron discharge is examined in detail. The computational domain is shown in Fig.1. The total pressure and temperature of mixture gas are SmTorr and 323K, respectively. The voltage amplitude is 200V. The magnetization in the magnets is 0.25T. We change mole fraction X o2 of oxygen. Fig. 2 shows the number density distributions of Ar+ and O- ions. The O- ions are trapped in the plasma bulk by the time-averaged potential. The spatial distribution of the density of O- ions is governed by a balance of generation and loss of O-. The positive ions Ar+, O-+, and O+ are distributed in such a way that the charge neutrality is kept in the plasma bulk. Consequently, the spatial distributions of Ar +, O2+, and O+ have two peaks. The number densities of Ar+ and O- ions drastically increase when oxygen is added to the discharge gas Ar. In the case when mole fraction Xo2 of oxygen increases, the self-bias voltage on the target decreases. This phenomenon is investigated in detail and a clear physical explanation is presented.

Original languageEnglish
Number of pages1
JournalIEEE International Conference on Plasma Science
Publication statusPublished - 2003 Oct 17
Event2003 IEEE International Conference on Plasma Science - Jeju, Korea, Republic of
Duration: 2003 Jun 22003 Jun 5

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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