Study on influence of O2 concentration in wafer cleaning ambient for smoothness of silicon (110) surface appearing at sidewall of three-dimensional transistors

Tomoyuki Suwa, Akinobu Teramoto, Yasuyuki Shirai, Takenobu Matsuo, Nobutaka Mizutani, Shigetoshi Sugawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science