Study on fabrication of titanium oxide films by oxygen pressure controlled pulsed laser deposition

Takahiro Nakamura, Eiichiro Matsubara, Nobuaki Sato, Atsushi Muramatsu, Hideyuki Takahashi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10 -6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

Original languageEnglish
Pages (from-to)2068-2072
Number of pages5
JournalMaterials Transactions
Volume45
Issue number7
DOIs
Publication statusPublished - 2004 Jul

Keywords

  • Grazing incidence X-ray scattering (GIXS)
  • Pulsed laser deposition (PLD)
  • Thin film
  • Titanium oxide
  • X-ray reflection

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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