Study on electron beam lithography with dye-doped polymer material

Yanlong Che, Okihiro Sugihara, Hideki Nakayama, Naomichi Okamoto

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)

Abstract

We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

Original languageEnglish
Pages (from-to)381-384
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume316
DOIs
Publication statusPublished - 1998 Jan 1
EventProceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) - St.Paul, MN, USA
Duration: 1998 May 181998 May 21

Keywords

  • Absorption spectrum
  • Diffraction grating
  • Electron-beam lithography
  • Guest-host polymer

ASJC Scopus subject areas

  • Condensed Matter Physics

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