Abstract
We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.
Original language | English |
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Pages (from-to) | 381-384 |
Number of pages | 4 |
Journal | Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals |
Volume | 316 |
DOIs | |
Publication status | Published - 1998 Jan 1 |
Event | Proceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) - St.Paul, MN, USA Duration: 1998 May 18 → 1998 May 21 |
Keywords
- Absorption spectrum
- Diffraction grating
- Electron-beam lithography
- Guest-host polymer
ASJC Scopus subject areas
- Condensed Matter Physics