Study on electron beam lithography with dye-doped polymer material

Yanlong Che; Okihiro Sugihara; Hideki Nakayama; Naomichi Okamoto

doi:10.1080/10587259808044532

Study on electron beam lithography with dye-doped polymer material

Yanlong Che, Okihiro Sugihara, Hideki Nakayama, Naomichi Okamoto

Institute of Multidisciplinary Research for Advanced Materials (IMRAM)

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ⁽²⁾ diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

Original language	English
Pages (from-to)	381-384
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	316
DOIs	https://doi.org/10.1080/10587259808044532
Publication status	Published - 1998 Jan 1
Event	Proceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) - St.Paul, MN, USA Duration: 1998 May 18 → 1998 May 21

Keywords

Absorption spectrum
Diffraction grating
Electron-beam lithography
Guest-host polymer

ASJC Scopus subject areas

Condensed Matter Physics

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10.1080/10587259808044532

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@article{7b89caa7a6c7443890c97d8b0af7a696,

title = "Study on electron beam lithography with dye-doped polymer material",

abstract = "We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.",

keywords = "Absorption spectrum, Diffraction grating, Electron-beam lithography, Guest-host polymer",

author = "Yanlong Che and Okihiro Sugihara and Hideki Nakayama and Naomichi Okamoto",

year = "1998",

month = jan,

day = "1",

doi = "10.1080/10587259808044532",

language = "English",

volume = "316",

pages = "381--384",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1542-1406",

publisher = "Taylor and Francis Ltd.",

note = "Proceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) ; Conference date: 18-05-1998 Through 21-05-1998",

}

TY - JOUR

T1 - Study on electron beam lithography with dye-doped polymer material

AU - Che, Yanlong

AU - Sugihara, Okihiro

AU - Nakayama, Hideki

AU - Okamoto, Naomichi

PY - 1998/1/1

Y1 - 1998/1/1

N2 - We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

AB - We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

KW - Absorption spectrum

KW - Diffraction grating

KW - Electron-beam lithography

KW - Guest-host polymer

UR - http://www.scopus.com/inward/record.url?scp=0032056918&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032056918&partnerID=8YFLogxK

U2 - 10.1080/10587259808044532

DO - 10.1080/10587259808044532

M3 - Conference article

AN - SCOPUS:0032056918

VL - 316

SP - 381

EP - 384

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

SN - 1542-1406

T2 - Proceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2)

Y2 - 18 May 1998 through 21 May 1998

ER -

Study on electron beam lithography with dye-doped polymer material

Abstract

Keywords

ASJC Scopus subject areas

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