Study on electron beam lithography with dye-doped polymer material

Yanlong Che; Okihiro Sugihara; Hideki Nakayama; Naomichi Okamoto

doi:10.1080/10587259808044532

Study on electron beam lithography with dye-doped polymer material

Yanlong Che, Okihiro Sugihara, Hideki Nakayama, Naomichi Okamoto

Institute of Multidisciplinary Research for Advanced Materials (IMRAM)

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ⁽²⁾ diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

Original language	English
Pages (from-to)	381-384
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	316
DOIs	https://doi.org/10.1080/10587259808044532
Publication status	Published - 1998 Jan 1
Event	Proceedings of the 1998 IEEE Instrumentation and Measurement Technology Conference, IMTC. Part 1 (of 2) - St.Paul, MN, USA Duration: 1998 May 18 → 1998 May 21

Keywords

Absorption spectrum
Diffraction grating
Electron-beam lithography
Guest-host polymer

ASJC Scopus subject areas

Condensed Matter Physics

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title = "Study on electron beam lithography with dye-doped polymer material",

abstract = "We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.",

keywords = "Absorption spectrum, Diffraction grating, Electron-beam lithography, Guest-host polymer",

author = "Yanlong Che and Okihiro Sugihara and Hideki Nakayama and Naomichi Okamoto",

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AU - Che, Yanlong

AU - Sugihara, Okihiro

AU - Nakayama, Hideki

AU - Okamoto, Naomichi

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Y1 - 1998/1/1

N2 - We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

AB - We report the study on electron-beam(EB) lithography with a dye-doped poled polymer. The mechanism of absorption spectrum change and nonlinear characteristics after EB exposure are investigated. Aχ(2) diffraction grating is successfully fabricated in this guest-host polymer material based on direct EB irradiation technique.

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KW - Diffraction grating

KW - Electron-beam lithography

KW - Guest-host polymer

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