Study of strain and giant magnetoresistance of Co/Cu magnetic multilayers

Kazufumi Suenaga, Gendo Oomi, Yoshiya Uwatoko, Kesami Saito, Koki Takanashi, Hiroyasu Fujimori

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


The electrical resistivity ρ in various magnetic fields and the structure of [Co(1.02 nm)/Cu(tCu)]25 magnetic multilayers (MML) have been investigated to clarify the relationship between the transport properties (electrical resistivity and magnetoresistance) and structure (orientation and strain of these layers). The in-plane compressive strain ε of antiferromagnetic (AF) Co/Cu MML with tCu = 1.05 nm is larger than that of ferromagnetic (F) Co/Cu MML with tCu = 0.76 nm. Furthermore, it is found that ε of the AF-Co/Cu MML is proportional to the magnitude of giant magnetoresistance, whereas that of F-MML is independent of magnetoresistance. This implies that the strain in AF-Co/Cu MMLs showing GMR is closely related to the spin-dependent scattering of conduction electrons at interfaces.

Original languageEnglish
Article number074715
Journaljournal of the physical society of japan
Issue number7
Publication statusPublished - 2006 Jul


  • Co/Cu magnetic multilayer
  • Compressive strain
  • Crystal structure
  • Giant magnetoresistance
  • Spin-dependent scattering

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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