Study of interdiffused layers near the surface of multilayers by total-reflection soft-X-ray fluorescence spectroscopy

Takashi Imazono, Yushi Hirayama, Shigera Ichikura, Osamu Kitakami, Mihiro Yanagihara, Makoto Watanabe

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Using soft-X-ray fluorescence spectroscopy with photon incidence at a critical angle of total reflection, it was made clear that SiO2 existed within a depth of a few nanometers from the surface of Fe/Si multilayers. It was generated by oxidation of the interdiffused Fe3Si layer nearest to the topmost Fe layer. Consequently, the Fe3Si layer was found to decrease in thickness. This result suggests that the total-reflection soft-X-ray fluorescence spectroscopy is fairly useful to analyze the chemical state of elements to a depth of a few nanometers from the surface.

Original languageEnglish
Pages (from-to)4334-4337
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number7 A
DOIs
Publication statusPublished - 2004 Jul 1

Keywords

  • Critical angle
  • Interdiffusion
  • Multilayer
  • Soft X-ray fluorescence
  • Surface
  • Total reflection

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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