Structures and vapor-sorption characteristics of sputtered polychlorotrifluoroethylene films treated by hydrogen-plasma

Iwao Sugimoto, Masayuki Nakamura, Hiroki Kuwano, Reiko Shimada

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Hydrogen-plasma treatment of the polychlorotrifluoroethylene (PCTFE) film produced by radio-frequency sputtering induces considerable elimination of halogen (fluorine and chlorine) atoms. This dehalogenation produces some noteworthy structural features: surface densification (crosslinks), trapped radicals, and incorporation of oxygen in the carbon networks. These structural changes modify the vapor-sorption properties of the sputtered PCTFE film, producing a molecular-sieving effect and enhancing the polar character of solubility properties of organic vapors.

Original languageEnglish
Pages (from-to)303-309
Number of pages7
JournalThin Solid Films
Volume310
Issue number1-2
DOIs
Publication statusPublished - 1997 Nov 21
Externally publishedYes

Keywords

  • Plasma processing and deposition
  • Polymers
  • Sensors
  • Sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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