Structure quality in deep X-ray lithography applying commercial polyimide-based masks

Sven Achenbach, Martin Boerner, Seichin Kinuta, Walter Bacher, Juergen Mohr, Volker Saile, Yasunori Saotome

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy