Structure of Si(001)-(4 × 3)-In surface studied by X-ray photoelectron diffraction

M. Shimomura, T. Nakamura, K. S. Kim, T. Abukawa, J. Tani, S. Kono

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

X-ray photoelectron diffraction (XPD) patterns of In 3d core levels have been measured for the Si(001)-(4 × 3)-In surface. An R factor analysis with single-scattering and multiple-scattering simulations of In 3d XPD patterns was performed for three structural models proposed so far. Only the model proposed by surface X-ray diffraction [Appl. Surf. Sci. 123/124, 104 (1998)] appeared to give a reasonably small R factor when the geometric parameters were modified from the original ones.

Original languageEnglish
Pages (from-to)1097-1102
Number of pages6
JournalSurface Review and Letters
Volume6
Issue number6
DOIs
Publication statusPublished - 1999 Dec

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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