Using a facing target sputtering equipment, Fe-Ti-N films were deposited on water-cooled and heated substrates under different nitrogen flow ratios, A(N2). The composition, microstructure, and Magnetic properties of the films were investigated by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and a vibrating sample magnetometer (VSM). The films consist of α-Fe, TiNx, and Fe4N, where the volume fraction of these phases varies with A(N2) and the substrate temperature during sputtering. The α-Fe(Ti) films with supersaturated nitrogen exhibit a larger Ms than the Fe-Ti films. However, Hs. first decreases and then increases with increasing R(N2). This is ascribed to a distortion of the α-Fe lattice due to doping of Ti atoms and the compressive stress caused by the incorporation of sufficient nitrogen atoms.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics