Structure and magnetic properties of Fe-Ti-N films deposited by DC magnetron facing target sputtering

D. L. Peng, K. Sumiyama, M. Oku, Tokushin Ri, K. Suzuki

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Using a facing target sputtering equipment, Fe-Ti-N films were deposited on water-cooled and heated substrates under different nitrogen flow ratios, A(N2). The composition, microstructure, and Magnetic properties of the films were investigated by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and a vibrating sample magnetometer (VSM). The films consist of α-Fe, TiNx, and Fe4N, where the volume fraction of these phases varies with A(N2) and the substrate temperature during sputtering. The α-Fe(Ti) films with supersaturated nitrogen exhibit a larger Ms than the Fe-Ti films. However, Hs. first decreases and then increases with increasing R(N2). This is ascribed to a distortion of the α-Fe lattice due to doping of Ti atoms and the compressive stress caused by the incorporation of sufficient nitrogen atoms.

Original languageEnglish
Pages (from-to)139-152
Number of pages14
JournalPhysica Status Solidi (A) Applied Research
Volume157
Issue number1
DOIs
Publication statusPublished - 1996 Jan 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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