Structure and hydrogen-absorption properties of LaNi5 thin films prepared by a sputtering method

Makoto Ohtsuka, Kentarou Harada, Toru Matsumoto, Kimio Itagaki

Research output: Contribution to conferencePaperpeer-review

2 Citations (Scopus)

Abstract

The structure and hydrogen-absorption properties of LaNi5 thin films were investigated in the present study. LaNi5 thin films were prepared by a sputtering method with a radio-frequency power, WS, of 50-400 W at substrate temperature, TS, of 323-573 K. Nickel content of the films decreased with increasing WS, however, there was no dependence on TS. At low WS and low TS, amorphous films were deposited. In other conditions, the films were polycrystalline. The films prepared at high WS and low TS, or at low WS and high TS exhibited only a (h k·0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high WS and high TS, the films with columnar structure were obtained. Hydrogen-absorption capacity of the thin films increased with increasing WS. The pressure plateau did not appear on the pressure-composition isotherms. The films deposited at high TS represented a higher equilibrium pressure.

Original languageEnglish
Pages167-175
Number of pages9
Publication statusPublished - 1998 Jan 1
EventProceedings of the 1998 TMS Annual Meeting - San Antonio, TX, USA
Duration: 1998 Feb 161998 Feb 19

Other

OtherProceedings of the 1998 TMS Annual Meeting
CitySan Antonio, TX, USA
Period98/2/1698/2/19

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys

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