Structure analysis of composition modulation in epitaxially-grown III-V semiconductor alloys

Manabu Ishimaru, Shigehiko Hasegawa, Hajime Asahi, Kazuhisa Sato, Toyohiko J. Konno

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It has been reported that composition modulation is naturally formed in some of the epitaxially-grown thin films. Structural characterization of these materials is necessary for controlling their nanostructures precisely. Here, we prepared epitaxially-grown III-V semiconductor alloys and characterized their atomistic structures by means of diffraction crystallography and electron microscopy techniques. As a consequence, we found that the following quantum well structures are spontaneously formed: (1) ultrashort period lateral composition modulation (LCM) with a modulation period of ∼1 nm; (2) complex vertical composition modulated (VCM) structures consisting of two modulated structures with a different period (∼4 and ∼25 nm). The former LCM structure is created via nanoscale phase separation at the growth surface, while the shorter-period modulation in the later VCM structure is induced by rotating a substrate through an inhomogeneous distribution of the anion flux within a chamber.

Original languageEnglish
Article number110120
JournalJapanese journal of applied physics
Issue number11 PART 1
Publication statusPublished - 2013 Nov

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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