Structural study of Ti O2 -based transparent conducting films

T. Hitosugi, N. Yamada, S. Nakao, K. Hatabayashi, T. Shimada, T. Hasegawa

    Research output: Contribution to journalArticle

    11 Citations (Scopus)

    Abstract

    We have investigated microscopic structures of sputter and pulsed laser deposited (PLD) anatase Nb-doped Ti O2 transparent conducting films, and discuss what causes the degradation of resistivity in sputter-deposited films. Cross-sectional transmission electron microscope and polarized optical microscope images show inhomogeneous intragrain structures and small grains of ∼10 μm in sputter-deposited films. From comparison with PLD films, these results suggest that homogeneous film growth is the important factor to obtain highly conducting sputter-deposited film.

    Original languageEnglish
    Pages (from-to)1027-1029
    Number of pages3
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume26
    Issue number4
    DOIs
    Publication statusPublished - 2008 Jul 10

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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  • Cite this

    Hitosugi, T., Yamada, N., Nakao, S., Hatabayashi, K., Shimada, T., & Hasegawa, T. (2008). Structural study of Ti O2 -based transparent conducting films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 26(4), 1027-1029. https://doi.org/10.1116/1.2944260