Structural studies of ultrathin silicon oxides and their interfaces by XPS

Takeo Hattori, Hiroaki Yamagishi, Noboru Koike, Keitaro Imai, Kikuo Yamabe

    Research output: Contribution to journalArticlepeer-review

    14 Citations (Scopus)

    Abstract

    From XPS depth profiling of silicon oxide films formed on (100), (110) and (111) surfaces prepared by various oxidation processes, the orientation dependent structure of ultrathin silicon oxide films, the weak stress relaxation effect on the chemical shift and the orientation dependent oxidation-induced chemical shifts were studied.

    Original languageEnglish
    Pages (from-to)416-419
    Number of pages4
    JournalApplied Surface Science
    Volume41-42
    Issue numberC
    DOIs
    Publication statusPublished - 1990 Jan

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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