Structural properties of amorphous carbon nitride films prepared by reactive rf-magnetron sputtering

Noriaki Nakayama, Yasuaki Tsuchiya, Satoru Tamada, Kouji Kosuge, Shinji Nagata, Katsumi Takahiro, Sadae Yamaguchi

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133 Citations (Scopus)

Abstract

Highly nitrogenated amorphous carbon films have been prepared by reactive rf-magnetron sputtering using pure N2 or Ar/N2 mixed gases. The nitrogen content measured by Rutherford backscattering spectrometry was 40 at% for pure N2 gas and 35 at% for Ar75%-N225% mixed gas. Oxygen atoms of about 7 at% were also detected. Infrared spectra showed a broad absorption band in the range from 1200 to 1600 cm-1 assigned to the N atoms incorporated in the bonding network of amorphous carbon. They showed an absorption band near 2200 cm-1 assigned to the C=N or N = C = 0 bond, but no trace of the N-H or C-H bond was seen.

Original languageEnglish
Pages (from-to)1465-1468
Number of pages4
JournalJapanese journal of applied physics
Volume32
Issue number10 A
DOIs
Publication statusPublished - 1993 Oct

Keywords

  • Amorphous
  • Carbon nitride
  • IR spectra
  • Rf-magnetron sputtering
  • Rutherford backscattering spectrometry
  • TEM
  • Thin films

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Nakayama, N., Tsuchiya, Y., Tamada, S., Kosuge, K., Nagata, S., Takahiro, K., & Yamaguchi, S. (1993). Structural properties of amorphous carbon nitride films prepared by reactive rf-magnetron sputtering. Japanese journal of applied physics, 32(10 A), 1465-1468. https://doi.org/10.1143/JJAP.32.L1465