Structural, electrical and optical properties of sputter-deposited Nb-doped TiO2 (TNO) polycrystalline films

Naoomi Yamada, Taro Hitosugi, Ngoc Lam Huong Hoang, Yutaka Furubayashi, Yasushi Hirose, Seiji Konuma, Toshihiro Shimada, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    64 Citations (Scopus)


    Transparent conductive oxide (TCO) films of polycrystalline Nb-doped TiO2 (TNO) were fabricated by post-annealing reactively sputtered amorphous films under H2 atmosphere. Carrier transport properties of the H2-annealed films were found to be strongly dependent on substrate temperature Ts and oxygen content in sputtering atmosphere. A minimum resistivity (ρ) of 9.5 × 10- 4 Ω cm and an average visible transmittance of ∼ 75% were obtained at Ts = RT and oxygen content of 10%. This ρ value is of the same order as those of epitaxial TNO films, indicating that polycrystalline TNO has sufficient potential as a practical TCO suitable for large-area applications.

    Original languageEnglish
    Pages (from-to)5754-5757
    Number of pages4
    JournalThin Solid Films
    Issue number17
    Publication statusPublished - 2008 Jul 1


    • Anatase
    • Nb-doped TiO
    • Polycrystalline films
    • Post-annealing
    • Sputtering
    • TNO
    • Transparent conductive oxide

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry


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