Structural, electrical, and optical properties of amorphous carbon nitride films prepared using a hybrid deposition technique

Masami Aono, Takanori Takeno, Toshiyuki Takagi

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

Amorphous carbon nitride (a-CNx) thin films were prepared using a hybrid deposition technique (HDT), which is a combination of RF and DC magnetron co-sputtering of a graphite target. We varied the nitrogen gas flow ratio (GFR, N2/N2 + Ar) during deposition to prepare a-CNx films with various nitrogen concentrations. The film properties were characterized using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The optical and electrical properties were also investigated. For 0.3 < GFR < 1, the optical band gap and resistivity increased with increasing nitrogen concentration (x = N/C) and sp3 C-N bonding fraction in the films. Compared to carbon nitride films with a comparable nitrogen content prepared by RF and DC sputtering, the optical band gap and resistivity of a-CNx films prepared by HDT were narrower and lower, respectively.

Original languageEnglish
Pages (from-to)120-124
Number of pages5
JournalDiamond and Related Materials
Volume63
DOIs
Publication statusPublished - 2016 Mar 1

Keywords

  • Amorphous carbon nitride
  • Electrical property
  • Hybrid deposition
  • Optical property
  • RF sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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