Structural, electrical and optical characterization of SrIrO3 thin films prepared by laser-ablation

Yuxue Liu, Hiroshi Masumoto, Takashi Goto

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

SrIrO3 thin films were prepared by laser ablating a monoclinic SrIrO3 target at the substrate temperature of 973 K with oxygen pressure ranging from 4 to 67 Pa. The glancing angle incidence X-ray diffraction (GIXRD) and micro-X-ray photoelectron spectroscopy (XPS) results suggested that SrIrO3 thin films were obtained. The resistivities and transmittance of SrIrO3 thin films at room temperature were in the range from 0.93 to 4.8 × 10-3 Ωm and from 0.20 to 0.30 in the wavelength range of 600-800 nm, respectively. The electrical property of SrIrO3 thin films changed from semiconductive to metallic with increasing the ablation oxygen pressure.

Original languageEnglish
Pages (from-to)100-104
Number of pages5
JournalMaterials Transactions
Volume46
Issue number1
DOIs
Publication statusPublished - 2005 Jan

Keywords

  • Atomic force microscopy
  • Glancing angle incidence X-ray diffraction
  • Resistivity
  • SrIrO films
  • Transmittance
  • X-ray photoelectron spectra

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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