Structural control of silicon oxide particles by oxygen partial pressure in RF plasma

Takeshi Sato, Atsushi Takeda, Yuki Kimura, Hitoshi Suzuki, Yoshio Saito, Chihiro Kaito

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Amorphous silicon oxide particles with the size of 30-100 nm were produced by spraying Si(C2H5O)4 liquid into a plasma region. Plasma was generated at a high pressure of 10 Torr in a mixture gas of argon and oxygen. The production of two silicon oxide particles with the structure of SiO and SiO2 could be controlled by the oxygen partial pressure in plasma.

Original languageEnglish
Pages (from-to)5896-5897
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number9 A
Publication statusPublished - 2003 Sep 1

Keywords

  • High-resolution transmission electron microscopy
  • Infrared spectroscopy
  • Oxygen partial pressure
  • RF plasma
  • Si(CHO)
  • Silicon oxide particle

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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