Structural and dielectric properties of anodic oxide film on Nb-Ti alloy

Satoshi Semboshi, Ko ichi Bando, Naofumi Ohtsu, Yonggu Shim, Toyohiko J. Konno

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The structural and dielectric properties of anodic oxide films on Nb and Nb-Ti alloys containing 1, 3, 5, 7, 10 and 15 at.% Ti were investigated. Anodized Nb-Ti alloys were covered with an anodic oxide film containing amorphous and partly crystalline Nb2O5 and TiO2. Increase of the Ti content in the alloy resulted in the increase of the anodic oxide film thickness and the amount of TiO2 in the oxide film, which led to an enhancement of the permittivity and a suppression of the leak current of the anodic oxide film. Therefore, both the capacitance and the leak current of anodized Nb-Ti alloys can be improved by controlling the composition of the alloy.

Original languageEnglish
Pages (from-to)8613-8619
Number of pages7
JournalThin Solid Films
Volume516
Issue number23
DOIs
Publication statusPublished - 2008 Oct 1

Keywords

  • Anodic oxidation
  • Capacitors
  • Niobium
  • Surface structure

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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