We report an experimental comparative study of graphene layers produced by micromechanical cleavage of bulk graphite materials of different origins and graphite films obtained by plasma enhanced chemical vapor deposition (PECVD). Structural characteristics of these materials were evaluated using Raman spectroscopy and electron microscopy. Field effect transistors (FETs) based on the PECVD graphene were produced using electron beam lithography. Conductivity, carrier mobility and other characteristics of the PECVD graphene obtained from Raman and FET tests were similar to the properties of graphene flakes obtained from bulk graphite materials. Taking into account the scalability of the CVD fabrication, these results confirm the possible industrial use of graphene films obtained by this method.
ASJC Scopus subject areas
- Materials Science(all)