Strong acid- and alkali-resistant ZrO2-TiO2 composite oxide thin films formed by low-pressure MOCVD

S. Kikkawa, Nobuyoshi Hara, K. Sugimoto

Research output: Contribution to journalConference article

5 Citations (Scopus)

Abstract

In order to obtain composite oxide films with corrosion resistances against both aqua regia and concentrated NaOH solutions, ZrO2-TiO2 films were formed on Pt and Si substrates by low pressure CVD techniques using zirconium-tetra-isopropoxide (Zr(O-i-C3H7)4) and titanium-tetra-isopropoxide (Ti(O-i-C3H7)4) and oxygen. The films obtained were composed of composite oxides of which the in-depth composition was uniform. The changes in the corrosion resistance of the films were investigated as a function of film composition. The corrosion resistance of the films in aqua regia increased with increasing cation fraction of Ti, but that in 10kmol·m-3 NaOH increased with increasing cation fraction of Zr. The highest corrosion resistance against both aqua regia and 10kmol·m-3 NaOH was obtained at a cation fraction of Zr of ca. 0.7. The films with such composition have homogeneous amorphous structures.

Original languageEnglish
Pages (from-to)497-504
Number of pages8
JournalMaterials Science Forum
Volume185-188
Publication statusPublished - 1995 Jan 1
EventProceedings of the 7th International Symposium on Passivity Passivation of Metals and Semiconductors - Clausthal, Ger
Duration: 1994 Aug 211994 Aug 26

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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