Stress inversion from initial tensile to compressive side during ultrathin oxide growth of the Si(100) surface

Masahiro Kitajima, Tetsuya Narushima, Takayuki Kurashina, Akiko N. Itakura, Seiichi Takami, Aruba Yamada, Kazuo Teraishi, Akira Miyamoto

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3 Citations (Scopus)

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