Strain relaxation in thick (11̄01) InGaN grown on GaN/Si substrate

Tomoyuki Tanikawa, Yoshio Honda, Masahito Yamaguchi, Hiroshi Amano, Nobuhiko Sawaki

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


We demonstrated the growth of thick InGaN on (11̄01) GaN/Si. The InGaN layer showed a marked inclination along the 〈0001〉 projection direction. The InGaN with a higher indium composition showed a larger inclination. Owing to the lattice mismatch between InGaN and GaN, misfit dislocations and/or stacking faults are generated from the heterointerface, which resulted in a larger inclination. As the indium content increased, inclining was observed in the early stage of InGaN growth. After InGaN was substantially relaxed, the crystallinity was saturated or improved. The surface morphology also became roughened because of the strain relaxation to form triangular grains, and then recovered following the coalescence.

Original languageEnglish
Pages (from-to)468-471
Number of pages4
JournalPhysica Status Solidi (B) Basic Research
Issue number3
Publication statusPublished - 2012 Mar


  • InGaN
  • Nitride semiconductors
  • Semipolar

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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