Strain distribution around a NiSi 2 /Si interface measured by convergent beam electron diffraction

Yutaka Wakayama, Shun Ichiro Tanaka

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The lattice strain distribution in a Si (001) substrate around NiSi 2 island is measured using convergent beam electron diffraction (CBED) over a submicron area. Lower symmetric CBED patterns are observed near the interface, demonstrating that compressing and tensile strains are distributed around NiSi 2 islands. The magnitude of the lattice strains, estimated by comparing the measurements with calculated CBED patterns, was found to be in the range of about 0.1 to 0.4%. Strain singularities were observed at NiSi 2 island corners and attributed to a sum of certain stress components. This feature of the strain distribution is thought to be related to the shape and dimensions of the NiSi 2 islands.

Original languageEnglish
Pages (from-to)285-288
Number of pages4
JournalApplied Surface Science
Volume117-118
DOIs
Publication statusPublished - 1997 Jun 2
Externally publishedYes

Keywords

  • CBED
  • Interface
  • NiSi islands
  • Si
  • Strain

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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