Step fluctuations on vicinal Si(113)

K. Sudoh, T. Yoshinobu, H. Iwasaki, Ellen D. Williams

Research output: Contribution to journalArticlepeer-review

45 Citations (Scopus)

Abstract

The fluctuation properties of steps relevant to step coalescence have been measured using scanning tunneling microscopy on a Si(113) surface miscut along a low symmetry azimuth. In local thermal equilibrium at 710 °C coexistence of single, double, triple, and quadruple steps has been observed. From direct measurement of the step-correlation function, the step stiffness is shown to be proportional to the step height, with an additional stabilization of double-height steps. This result is shown to require a step-step attraction energy close to kT.

Original languageEnglish
Pages (from-to)5152-5155
Number of pages4
JournalPhysical review letters
Volume80
Issue number23
DOIs
Publication statusPublished - 1998
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint

Dive into the research topics of 'Step fluctuations on vicinal Si(113)'. Together they form a unique fingerprint.

Cite this