Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

T. Kondo; Y. Sawada; K. Akiyama; H. Funakubo; T. Kiguchi; S. Seki; M. H. Wang; T. Uchida

doi:10.1016/j.tsf.2007.10.040

Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

T. Kondo, Y. Sawada, K. Akiyama, H. Funakubo, T. Kiguchi, S. Seki, M. H. Wang, T. Uchida

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Tin-doped In₂O₃ (indium-tin-oxide) films were deposited on non-flat Si substrates using an original spray chemical vapor deposition (CVD) system. When the deposition temperature was 300-350 °C, ITO films covered all surfaces (top surface, side walls, and bottom; opening size was 1 μm) after being sprayed 50 times. The step coverage decreased as the number of spray increased because the opening size became smaller due to the layered ITO films, and it therefore became increasingly difficult to supply raw materials. The ITO films could not be deposited when the grooves narrowed to less than 0.18 μm. The step coverage of ITO films clearly increased, although the deposition rate decreased due to the decreasing deposition temperature.

Original language	English
Pages (from-to)	5864-5867
Number of pages	4
Journal	Thin Solid Films
Volume	516
Issue number	17
DOIs	https://doi.org/10.1016/j.tsf.2007.10.040
Publication status	Published - 2008 Jul 1
Externally published	Yes

Keywords

Indium-tin-oxide
Patterned substrates
Spray CVD
Step coverage

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2007.10.040

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title = "Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures",

abstract = "Tin-doped In2O3 (indium-tin-oxide) films were deposited on non-flat Si substrates using an original spray chemical vapor deposition (CVD) system. When the deposition temperature was 300-350 °C, ITO films covered all surfaces (top surface, side walls, and bottom; opening size was 1 μm) after being sprayed 50 times. The step coverage decreased as the number of spray increased because the opening size became smaller due to the layered ITO films, and it therefore became increasingly difficult to supply raw materials. The ITO films could not be deposited when the grooves narrowed to less than 0.18 μm. The step coverage of ITO films clearly increased, although the deposition rate decreased due to the decreasing deposition temperature.",

keywords = "Indium-tin-oxide, Patterned substrates, Spray CVD, Step coverage",

author = "T. Kondo and Y. Sawada and K. Akiyama and H. Funakubo and T. Kiguchi and S. Seki and Wang, {M. H.} and T. Uchida",

note = "Funding Information: The authors thank Prof. Y. Shirai of our Institute for the use of X-ray fluorescence analyzer and the Ministry of Education, Culture, Sports, Science and Technology (MEXT) for financial support of “High-Tech Research Center” Project (2005–2009).",

year = "2008",

month = jul,

day = "1",

doi = "10.1016/j.tsf.2007.10.040",

language = "English",

volume = "516",

pages = "5864--5867",

journal = "Thin Solid Films",

issn = "0040-6090",

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T1 - Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

AU - Kondo, T.

AU - Sawada, Y.

AU - Akiyama, K.

AU - Funakubo, H.

AU - Kiguchi, T.

AU - Seki, S.

AU - Wang, M. H.

AU - Uchida, T.

N1 - Funding Information: The authors thank Prof. Y. Shirai of our Institute for the use of X-ray fluorescence analyzer and the Ministry of Education, Culture, Sports, Science and Technology (MEXT) for financial support of “High-Tech Research Center” Project (2005–2009).

PY - 2008/7/1

Y1 - 2008/7/1

N2 - Tin-doped In2O3 (indium-tin-oxide) films were deposited on non-flat Si substrates using an original spray chemical vapor deposition (CVD) system. When the deposition temperature was 300-350 °C, ITO films covered all surfaces (top surface, side walls, and bottom; opening size was 1 μm) after being sprayed 50 times. The step coverage decreased as the number of spray increased because the opening size became smaller due to the layered ITO films, and it therefore became increasingly difficult to supply raw materials. The ITO films could not be deposited when the grooves narrowed to less than 0.18 μm. The step coverage of ITO films clearly increased, although the deposition rate decreased due to the decreasing deposition temperature.

AB - Tin-doped In2O3 (indium-tin-oxide) films were deposited on non-flat Si substrates using an original spray chemical vapor deposition (CVD) system. When the deposition temperature was 300-350 °C, ITO films covered all surfaces (top surface, side walls, and bottom; opening size was 1 μm) after being sprayed 50 times. The step coverage decreased as the number of spray increased because the opening size became smaller due to the layered ITO films, and it therefore became increasingly difficult to supply raw materials. The ITO films could not be deposited when the grooves narrowed to less than 0.18 μm. The step coverage of ITO films clearly increased, although the deposition rate decreased due to the decreasing deposition temperature.

KW - Indium-tin-oxide

KW - Patterned substrates

KW - Spray CVD

KW - Step coverage

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DO - 10.1016/j.tsf.2007.10.040

M3 - Article

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VL - 516

SP - 5864

EP - 5867

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 17

ER -

Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

Abstract

Keywords

ASJC Scopus subject areas

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