Step and repeat ultraviolet nanoimprinting under pentafluoropropane gas ambient

Shuso Iyoshi, Makoto Okada, Tetsuya Katase, Katsuhiko Tone, Kei Kobayashi, Shu Kaneko, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)


    In the UV nanoimprinting process an antisticking layer such as fluorinated self-assembled monolayer (F-SAM) is grafted on the mold surface to diminish the demolding impact. These layers are supposed to deteriorate as the imprint steps mount up, resulting in defects in the cured resist layer. In this work, continuous multiple shots of UV nanoimprint were conducted in the air and in pentafluoropropane (PFP) gas environment and demolding forces in every imprint step were determined. The experiments revealed that the demolding forces for the imprint in PFP atmosphere drastically reduced compared with those in the air. Water contact angles of the mold surface were also determined in every 225 imprint steps to observe the degree of degradation of the antisticking layer. It was found that the antisticking layer was less damaged or contaminated in the PFP environment than it was in the air after a certain number of imprint steps.

    Original languageEnglish
    Article number06FJ08
    JournalJapanese journal of applied physics
    Issue number6 PART 2
    Publication statusPublished - 2012 Jun 1

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)


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