Staining-free observation of polymer blend thin films on transmission extreme ultraviolet microscopy

Mitsunori Toyoda; Shunsuke Aizawa; Shiori Gondai; Toshiyuki Kakudate; Masaki Ageishi; Hiroshi Jinnai; Jun Chen

doi:10.35848/1882-0786/aba882

Staining-free observation of polymer blend thin films on transmission extreme ultraviolet microscopy

Mitsunori Toyoda, Shunsuke Aizawa, Shiori Gondai, Toshiyuki Kakudate, Masaki Ageishi, Hiroshi Jinnai, Jun Chen

Research output: Contribution to journal › Article › peer-review

Abstract

Transmission extreme ultraviolet microscopy is applied to the staining-free observation of a poly(styrene-methyl methacrylate) (PS/PMMA) blend. At a photon energy of 92 eV, the imaginary part of the atomic scattering factor for oxygen, which represents the absorption, is four-times larger than that of carbon, and microstructures can be visualized by the contrast resulting from the presence of oxygen. Based on the signal to noise ratio of the images, we consider the optimum photon energy and sample thickness for common polymer blends. Finally, a practical high contrast of 30% is successfully demonstrated for the PS/PMMA thin film.

Original language	English
Article number	082011
Journal	Applied Physics Express
Volume	13
Issue number	8
DOIs	https://doi.org/10.35848/1882-0786/aba882
Publication status	Published - 2020 Aug 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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abstract = "Transmission extreme ultraviolet microscopy is applied to the staining-free observation of a poly(styrene-methyl methacrylate) (PS/PMMA) blend. At a photon energy of 92 eV, the imaginary part of the atomic scattering factor for oxygen, which represents the absorption, is four-times larger than that of carbon, and microstructures can be visualized by the contrast resulting from the presence of oxygen. Based on the signal to noise ratio of the images, we consider the optimum photon energy and sample thickness for common polymer blends. Finally, a practical high contrast of 30% is successfully demonstrated for the PS/PMMA thin film.",

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AU - Toyoda, Mitsunori

AU - Aizawa, Shunsuke

AU - Gondai, Shiori

AU - Kakudate, Toshiyuki

AU - Ageishi, Masaki

AU - Jinnai, Hiroshi

AU - Chen, Jun

PY - 2020/8/1

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N2 - Transmission extreme ultraviolet microscopy is applied to the staining-free observation of a poly(styrene-methyl methacrylate) (PS/PMMA) blend. At a photon energy of 92 eV, the imaginary part of the atomic scattering factor for oxygen, which represents the absorption, is four-times larger than that of carbon, and microstructures can be visualized by the contrast resulting from the presence of oxygen. Based on the signal to noise ratio of the images, we consider the optimum photon energy and sample thickness for common polymer blends. Finally, a practical high contrast of 30% is successfully demonstrated for the PS/PMMA thin film.

AB - Transmission extreme ultraviolet microscopy is applied to the staining-free observation of a poly(styrene-methyl methacrylate) (PS/PMMA) blend. At a photon energy of 92 eV, the imaginary part of the atomic scattering factor for oxygen, which represents the absorption, is four-times larger than that of carbon, and microstructures can be visualized by the contrast resulting from the presence of oxygen. Based on the signal to noise ratio of the images, we consider the optimum photon energy and sample thickness for common polymer blends. Finally, a practical high contrast of 30% is successfully demonstrated for the PS/PMMA thin film.

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