Stabilization of temperature characteristics of micromirror for low-voltage driving using thin film torsion bar of tensile poly-Si

Minoru Sasaki, Masayuki Fujishima, Kazuhiro Hane, Hideo Miura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The micromirror with the tense thin film torsion bar can realize the low-voltage driving. The temperature characteristic is improved using polycrystalline (poly-) Si thin film taking advantage of the following features. The large tensile stress is obtained by the crystallization of amorphous (a-) Si film. The doping realizes the electrical connection. The poly-Si has the almost same coefficient of thermal expansion (CTE) with that of Si substrate.

Original languageEnglish
Title of host publication2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Pages120-121
Number of pages2
DOIs
Publication statusPublished - 2008 Oct 23
Event2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS - Freiburg, Germany
Duration: 2008 Aug 112008 Aug 14

Publication series

Name2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

Other

Other2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
CountryGermany
CityFreiburg
Period08/8/1108/8/14

Keywords

  • Crystallization induced stress
  • Micromirror
  • Temperature characteristics
  • Tensile stress
  • Thin film torsion bar

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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    Sasaki, M., Fujishima, M., Hane, K., & Miura, H. (2008). Stabilization of temperature characteristics of micromirror for low-voltage driving using thin film torsion bar of tensile poly-Si. In 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS (pp. 120-121). [4607858] (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS). https://doi.org/10.1109/OMEMS.2008.4607858