Stability of sputtered Mo/BN, W/BN, Mo/B4C, and W/B4C soft X-ray multilayers under exposure to multipole-wiggler radiation

Mihiro Yanagihara, Kou Mayama, Yoshinori Goto, Isao Kusunoki, Seiji Asaoka, Hideki Maezawa

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

The effect of white wiggler radiation exposure on Mo/BN, W/BN, Mo/B4C, and W/B4C multilayers was evaluated by comparing soft X-ray reflectance. All samples were prepared by magnetron sputtering onto SiC substrates. The choice of combinations was based upon thermal annealing tests for Mo X and W X (X = C, Si, BN, and B4C) multilayers, prior to any exposure tests. On exposure under radiation power density of ∼ 2.3 W/mm2 for ten minutes the Mo/BN and W/BN samples underwent ∼20% and ∼65% degradation in reflectance, while the Mo/B4C and W/B4C samples were almost destroyed. Of the four samples the Mo/BN multilayer was the most stable. The result was qualitatively consistent with that of the anneal tests.

Original languageEnglish
Pages (from-to)638-642
Number of pages5
JournalNuclear Inst. and Methods in Physics Research, A
Volume334
Issue number2-3
DOIs
Publication statusPublished - 1993 Oct 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Fingerprint Dive into the research topics of 'Stability of sputtered Mo/BN, W/BN, Mo/B<sub>4</sub>C, and W/B<sub>4</sub>C soft X-ray multilayers under exposure to multipole-wiggler radiation'. Together they form a unique fingerprint.

Cite this