Sputtering yield of vapor-deposited TiC films by low energy deuterium ions

Tatsuo Shikama, J. Bohdansky

Research output: Contribution to journalLetterpeer-review

1 Citation (Scopus)
Original languageEnglish
Pages (from-to)328-330
Number of pages3
JournalJournal of Nuclear Materials
Issue number2-3
Publication statusPublished - 1988 May

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

Cite this