TY - JOUR
T1 - Sputtering yield of vapor-deposited TiC films by low energy deuterium ions
AU - Shikama, Tatsuo
AU - Bohdansky, J.
PY - 1988/5
Y1 - 1988/5
UR - http://www.scopus.com/inward/record.url?scp=0024016874&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0024016874&partnerID=8YFLogxK
U2 - 10.1016/0022-3115(88)90344-3
DO - 10.1016/0022-3115(88)90344-3
M3 - Letter
AN - SCOPUS:0024016874
VL - 152
SP - 328
EP - 330
JO - Journal of Nuclear Materials
JF - Journal of Nuclear Materials
SN - 0022-3115
IS - 2-3
ER -