Sputtering yields at energies ranging from 0.5 to 8 keV have been determined for oxygen and neon sputtering of thin carbon films, deposited on metal substrates. In order to investigate the influence of chemical sputtering, the restgas composition was monitored with a quadrupole mass spectrometer, and the changes in the carbon layer thickness after sputtering were compared to the amount of sputtered carbon which had been collected on a surface situated in a backward direction. The small amount of carbon that was found on the collectors after sputtering with oxygen ions was taken to indicate that there is a significant contribution from chemical sputtering, even at room temperature. The residual carbon layers were investigated with SIMS after sputtering.
ASJC Scopus subject areas
- Nuclear and High Energy Physics