Sputter deposition of anatase titanum dioxide transparent conducting films

Naoomi Yamada, Taro Hitosugi, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)


    We report recent progress on sputter-deposition of Ti0.94Nb 0.06O2 polycrystalline (poly-TNO) thin films as ITO-alternative transparent conductor. In order to achieve low resistivity (ρ) in TNO, it is necessary to introduce oxygen deficiencies into anatase phase. However, growth of poly-TNO films on glass under relatively reducing atmosphere tends to stabilize the rutile phase with higher resistivity. We overcame this difficulty by developing a bi-layer technique using a TNO seed-layer, which prevents the formation of the rutile phase even under reducing deposition conditions. As a result, we succeeded in directly fabricating poly-TNO films with ρ of ∼1 × 10-3 Ω cm and visible transmittance of 60-80%, although we still need to further improve these properties towards practical applications. By comparing carrier transport properties between poly-TNO films obtained by different synthesis routes, we discuss on material parameters that govern resistivity of poly-TNO films.

    Original languageEnglish
    Pages (from-to)602-607
    Number of pages6
    JournalShinku/Journal of the Vacuum Society of Japan
    Issue number9
    Publication statusPublished - 2008

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering


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