TY - JOUR
T1 - Spontaneous motion observed in highly sensitive surface relief formation system
AU - Ubukata, Takashi
AU - Higuchi, Takeshi
AU - Zettsu, Nobuyuki
AU - Seki, Takahiro
AU - Hara, Masahiko
N1 - Funding Information:
This work was supported, in part, by a Grant-in-Aid for Scientific Research ‘KAKENHI (14740391)’ from the Ministry of Education, Culture, Sports, Science and Technology. T.U. gratefully acknowledges the fellowship ‘Special Postdoctoral Researchers Program’ provided by RIKEN.
PY - 2005/5/5
Y1 - 2005/5/5
N2 - Surface relief gratings formed on a liquid-crystalline azobenzene polymer film known as a highly sensitive system were investigated to obtain deeper insights into polymer migration on the micrometer scale. A surface relief formation was induced with incoherent nonpolarized patterned blue-light using a photomask instead of interference patterns of a coherent laser. Spontaneous lateral migration was observed under the edge of the grating photomask at room temperature even after terminating light irradiation. It was found that interfacial tension and the living cis form of azobenzene are essential for inducing spontaneous motion.
AB - Surface relief gratings formed on a liquid-crystalline azobenzene polymer film known as a highly sensitive system were investigated to obtain deeper insights into polymer migration on the micrometer scale. A surface relief formation was induced with incoherent nonpolarized patterned blue-light using a photomask instead of interference patterns of a coherent laser. Spontaneous lateral migration was observed under the edge of the grating photomask at room temperature even after terminating light irradiation. It was found that interfacial tension and the living cis form of azobenzene are essential for inducing spontaneous motion.
KW - Atomic force microscopy
KW - Azobenzene
KW - Liquid-crystalline polymer
KW - Photomask
KW - Surface relief gratings
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U2 - 10.1016/j.colsurfa.2004.10.121
DO - 10.1016/j.colsurfa.2004.10.121
M3 - Article
AN - SCOPUS:15244343870
VL - 257-258
SP - 123
EP - 126
JO - Colloids and Surfaces A: Physicochemical and Engineering Aspects
JF - Colloids and Surfaces A: Physicochemical and Engineering Aspects
SN - 0927-7757
ER -