TY - JOUR
T1 - Spatial point analysis of ion track patterns using common polymer films by atomic forced microscopy
AU - Omichi, Masaaki
AU - Choi, Wookjin
AU - Tsukuda, Satoshi
AU - Sugimoto, Masaki
AU - Seki, Shu
N1 - Publisher Copyright:
© 2014SPST.
PY - 2014/9/25
Y1 - 2014/9/25
N2 - In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.
AB - In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.
KW - Charged particle
KW - Ion track
KW - Nearest neighbor method
KW - Spatial point analysis
UR - http://www.scopus.com/inward/record.url?scp=84907509320&partnerID=8YFLogxK
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U2 - 10.2494/photopolymer.27.561
DO - 10.2494/photopolymer.27.561
M3 - Article
AN - SCOPUS:84907509320
VL - 27
SP - 561
EP - 564
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 5
ER -
