Spatial point analysis of ion track patterns using common polymer films by atomic forced microscopy

Masaaki Omichi; Wookjin Choi; Satoshi Tsukuda; Masaki Sugimoto; Shu Seki

doi:10.2494/photopolymer.27.561

Spatial point analysis of ion track patterns using common polymer films by atomic forced microscopy

Masaaki Omichi, Wookjin Choi, Satoshi Tsukuda, Masaki Sugimoto, Shu Seki

Division of Process and System Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.

Original language	English
Pages (from-to)	561-564
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	27
Issue number	5
DOIs	https://doi.org/10.2494/photopolymer.27.561
Publication status	Published - 2014 Sep 25

Keywords

Charged particle
Ion track
Nearest neighbor method
Spatial point analysis

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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AU - Tsukuda, Satoshi

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AU - Seki, Shu

PY - 2014/9/25

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