Spatial point analysis of ion track patterns using common polymer films by atomic forced microscopy

Masaaki Omichi, Wookjin Choi, Satoshi Tsukuda, Masaki Sugimoto, Shu Seki

Research output: Contribution to journalArticlepeer-review

Abstract

In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.

Original languageEnglish
Pages (from-to)561-564
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume27
Issue number5
DOIs
Publication statusPublished - 2014 Sep 25

Keywords

  • Charged particle
  • Ion track
  • Nearest neighbor method
  • Spatial point analysis

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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