Spatial distribution of properties of a-IGZO films deposited by rotation magnet sputtering incorporating dual target structure

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A new magnetron sputtering equipment called rotation magnet sputtering incorporating dual planar target structure was developed to obtain high target utilization and wide high-quality-film-deposition region by moving multiple plasma loops. This new system was applied to a-IGZO film depositions. Spatial distributions of film properties were investigated.

Original languageEnglish
Title of host publicationSociety for Information Display - 19th International Display Workshops 2012, IDW/AD 2012
Pages539-542
Number of pages4
Publication statusPublished - 2012 Dec 1
Event19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012 - Kyoto, Japan
Duration: 2012 Dec 42012 Dec 7

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Other

Other19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012
Country/TerritoryJapan
CityKyoto
Period12/12/412/12/7

Keywords

  • A-IGZO
  • Microwave photoconductivity decay method
  • Rotation magnet sputtering
  • Thin film transistor

ASJC Scopus subject areas

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

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