Spatial distribution and polarization dependence of the optical near-field in a silicon microfabricated probe

P. N. Minh, T. Ono, S. Tanaka, M. Esashi

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

This paper reports on the spatial distribution and polarization behaviour of the optical near-field at the aperture of a Si micromachined probe. A sub-100 nm aperture at the apex of a SiO2 tip on a Si cantilever was successfully fabricated by selective etching of the SiO2 tip in a buffered-HF solution using a thin Cr film as a mask. The aperture, 10-100 nm in size, can be reproducibly fabricated by optimizing the etching time. The optical throughput of several apertures was measured. For a 100 nm aperture, a throughput of 1% was approved. The probe shows a very high optical throughput owing to the geometrical structure of the tip. The spatial distribution of the near-field light is measured and simulated using a finite difference-time domain method. The polarization behaviour of apertures with different shapes was analysed using a photon counting camera system.

Original languageEnglish
Pages (from-to)28-33
Number of pages6
JournalJournal of Microscopy
Volume202
Issue number1
DOIs
Publication statusPublished - 2001 May 5

Keywords

  • Aperture
  • FDTD
  • NSOM
  • Near-field optics
  • Optical throughput
  • Polarization
  • Probe
  • Silicon micromachining

ASJC Scopus subject areas

  • Pathology and Forensic Medicine
  • Histology

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