Spatial correlation between chemical and topological defects in vitreous silica: UV-resonance Raman study

M. Saito, F. Damico, F. Bencivenga, R. Cucini, A. Gessini, E. Principi, C. Masciovecchio

Research output: Contribution to journalArticlepeer-review

Abstract

A spatial correlation between chemical and topological defects in the tetrahedron network in vitreous silica produced by a fusion process of natural quartz crystals was found by synchrotron-based UV resonance Raman experiments. Furthermore, a quantitative correlation between these defects was obtained by comparing visible Raman and UV absorption spectra. These results indicate that in vitreous silica produced by the fusion process the topological defects disturb the surrounding tetrahedral silica network and induce further disorder regions with sub nanometric sizes.

Original languageEnglish
Article number244505
JournalJournal of Chemical Physics
Volume140
Issue number24
DOIs
Publication statusPublished - 2014 Jun 28
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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