Soft x-ray multilayers fabricated by electron-beam deposition

Masaaki Sudoh, Ryouhei Yokohama, Mitsuo Sumiya, Masaki Yamamoto, Mihiro Yanagihara, Takeshi Namioka

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures of room temperature to 420 °C and at deposition rates of 0.2-10 angstrom/sec were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x-rays of 110-170 angstrom. The optimum deposition parameters were found to be 100-150 °C and 0.2-2 angstrom/sec, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of approx.30% for unpolarized soft x-ray of 146 angstrom at an incident angle of 20°.

Original languageEnglish
Pages (from-to)14-24
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1343
DOIs
Publication statusPublished - 1991
EventX-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography - San Diego, CA, USA
Duration: 1990 Jul 91990 Jul 13

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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