Soft x-ray analysis system for reflection, secondary electron, and fluorescence spectroscopy

Y. Hirai, I. Waki, A. Momose, K. Hayakawa

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

This article describes an UHV compatable soft x-ray analysis system for reflection, secondary electron, and fluorescence spectroscopy. It is equipped with a reflectometer with an angular accuracy of 0.01°. This is achieved with rotary encoders directly coupled to the rotation axes. At the same time, the system is equipped with an electron multiplier, a cylindrical mirror analyzer, and a Si(Li) detector, each for measuring total secondary electrons, photo- and Auger electrons, and fluorescence. Furthermore, it is possible to form multilayer films and analyze them in situ. The performance of the reflectometer has been tested on the beamline BL-8A at the Photon Factory. We present the results of reflectivity measurements for diamond-cut copper mirrors and Langmuir-Blodgett films.

Original languageEnglish
Pages (from-to)2219-2222
Number of pages4
JournalReview of Scientific Instruments
Volume60
Issue number7
DOIs
Publication statusPublished - 1989 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation

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