Soft X-ray absorption and emission study of silicon oxynitride/Si(100) interface

Yoshiyuki Yamashita, Kazuhiro Oguchi, Kozo Mukai, Jun Yoshinobu, Yoshihisa Harada, Takashi Tokushima, Shik Shin, Naoyoshi Tamura, Hiroshi Nohira, Takeo Hattori

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