SOft Magretic Properties of Fe-N and Fe-Si-N Thin Films Sputtered in (Ar+N2) Plasma

M. Takahashi, H. Shoji, T. Shimatsu, H. Komaba, T. Wakiyama

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

Soft Magnetic properties for sputtered (O~3wt%)Si-Fe alloy thin films fabricated in (Ar+N2) plasma were investigated in connection with metallurgical structure. 2.7wt%Si-Fe film annealed at 400°C shows high effective permeability μeff about 1600 at 5MHz. It has been observed that this film consists of a-phase with grain size less than 150A and a slight expansion of lattice spacing of the (110) plane. To understand the magnetoelastic effect on permeability, the total magnetic anisotropy in the (110) plane of each grain,U(110)‘ were calculated for shear and tetragonal deformation modes. U(110) increases with increasing the strain for shear deformation mode, while U (110) decreases as the positive strain increases and has a minimum for tetragonal deformation mode. It is supposed that the decrease in total magnetic anisotropy in each grain through the magnetostrictive anisotropy due to tetragonal deformation and the reduction of grain size are essential to realize high μeff for Fe-Si films.

Original languageEnglish
Pages (from-to)1503-1505
Number of pages3
JournalIEEE Transactions on Magnetics
Volume26
Issue number5
DOIs
Publication statusPublished - 1990 Sep

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'SOft Magretic Properties of Fe-N and Fe-Si-N Thin Films Sputtered in (Ar+N2) Plasma'. Together they form a unique fingerprint.

Cite this