Soft Magnetic Properties and Microstructure of Co-Ta-N Films

T. Shimatsu, W. Kimura, K. Satoh, H. Shoji, M. Takahashi, T. Wakiyama

Research output: Contribution to journalArticlepeer-review

Abstract

Co-(0 to 15 at%)Ta-N sputtered films were studied in order to clarify the correlation between the structure, induced magnetic anisotropy, local anisotropy fluctuation, and soft magnetic properties. The results for electrical resistivity and film magnetostriction indicate that the temperature Txl at which Co crystallites are formed from an amorphous structure is lower than the temperature at which crystallites of Ta-nitrides are formed. The difference was 150°C for Co-15 at% Ta-N films. A large uniaxial magnetic anisotropy was induced at Txl by annealing in a magnetic field, and even after crystallization, a uniaxial anisotropy of magnitude 2xl03 erg/cc could be reversibly induced by annealing in a magnetic field.

Original languageEnglish
Pages (from-to)927-933
Number of pages7
JournalIEEE Translation Journal on Magnetics in Japan
Volume8
Issue number12
DOIs
Publication statusPublished - 1993 Dec

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)

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