Smoothing sidewalls of a MEMS-based silicon X-ray optics

Teppei Moriyama; Yuichiro Ezoe; Tomohiro Ogawa; Takaya Ohashi; Ikuyuki Mitsuishi; Makoto Mita; Kazuhisa Mitsuda; Yoshiaki Kanamori; Akio Maeda

doi:10.1109/OMEMS.2011.6031043

Smoothing sidewalls of a MEMS-based silicon X-ray optics

Teppei Moriyama, Yuichiro Ezoe, Tomohiro Ogawa, Takaya Ohashi, Ikuyuki Mitsuishi, Makoto Mita, Kazuhisa Mitsuda, Yoshiaki Kanamori, Akio Maeda

ENG - Robotics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.

Original language	English
Title of host publication	Proceedings - OMN2011
Subtitle of host publication	16th International Conference on Optical MEMS and Nanophotonics
Pages	205-206
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2011.6031043
Publication status	Published - 2011 Dec 12
Event	16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey Duration: 2011 Aug 8 → 2011 Aug 11

Publication series

Name	International Conference on Optical MEMS and Nanophotonics
ISSN (Print)	2160-5033
ISSN (Electronic)	2160-5041

Other

Other	16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Country/Territory	Turkey
City	Istanbul
Period	11/8/8 → 11/8/11

Keywords

DRIE
X-ray
optics
space mission

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/OMEMS.2011.6031043

Cite this

Moriyama, T., Ezoe, Y., Ogawa, T., Ohashi, T., Mitsuishi, I., Mita, M., Mitsuda, K., Kanamori, Y., & Maeda, A. (2011). Smoothing sidewalls of a MEMS-based silicon X-ray optics. In Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics (pp. 205-206). [6031043] (International Conference on Optical MEMS and Nanophotonics). https://doi.org/10.1109/OMEMS.2011.6031043

Smoothing sidewalls of a MEMS-based silicon X-ray optics. / Moriyama, Teppei; Ezoe, Yuichiro; Ogawa, Tomohiro et al.

Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics. 2011. p. 205-206 6031043 (International Conference on Optical MEMS and Nanophotonics).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Moriyama, T, Ezoe, Y, Ogawa, T, Ohashi, T, Mitsuishi, I, Mita, M, Mitsuda, K, Kanamori, Y & Maeda, A 2011, Smoothing sidewalls of a MEMS-based silicon X-ray optics. in Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics., 6031043, International Conference on Optical MEMS and Nanophotonics, pp. 205-206, 16th International Conference on Optical MEMS and Nanophotonics, OMN2011, Istanbul, Turkey, 11/8/8. https://doi.org/10.1109/OMEMS.2011.6031043

@inproceedings{cb2cfff0d9f14af781b69341551e8efe,

title = "Smoothing sidewalls of a MEMS-based silicon X-ray optics",

abstract = "X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.",

keywords = "DRIE, X-ray, optics, space mission",

author = "Teppei Moriyama and Yuichiro Ezoe and Tomohiro Ogawa and Takaya Ohashi and Ikuyuki Mitsuishi and Makoto Mita and Kazuhisa Mitsuda and Yoshiaki Kanamori and Akio Maeda",

year = "2011",

month = dec,

day = "12",

doi = "10.1109/OMEMS.2011.6031043",

language = "English",

isbn = "9781457703362",

series = "International Conference on Optical MEMS and Nanophotonics",

pages = "205--206",

booktitle = "Proceedings - OMN2011",

note = "16th International Conference on Optical MEMS and Nanophotonics, OMN2011 ; Conference date: 08-08-2011 Through 11-08-2011",

}

TY - GEN

T1 - Smoothing sidewalls of a MEMS-based silicon X-ray optics

AU - Moriyama, Teppei

AU - Ezoe, Yuichiro

AU - Ogawa, Tomohiro

AU - Ohashi, Takaya

AU - Mitsuishi, Ikuyuki

AU - Mita, Makoto

AU - Mitsuda, Kazuhisa

AU - Kanamori, Yoshiaki

AU - Maeda, Akio

PY - 2011/12/12

Y1 - 2011/12/12

N2 - X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.

AB - X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.

KW - DRIE

KW - X-ray

KW - optics

KW - space mission

UR - http://www.scopus.com/inward/record.url?scp=82955193750&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=82955193750&partnerID=8YFLogxK

U2 - 10.1109/OMEMS.2011.6031043

DO - 10.1109/OMEMS.2011.6031043

M3 - Conference contribution

AN - SCOPUS:82955193750

SN - 9781457703362

T3 - International Conference on Optical MEMS and Nanophotonics

SP - 205

EP - 206

BT - Proceedings - OMN2011

T2 - 16th International Conference on Optical MEMS and Nanophotonics, OMN2011

Y2 - 8 August 2011 through 11 August 2011

ER -

Smoothing sidewalls of a MEMS-based silicon X-ray optics

Abstract

Publication series

Other

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this