Smoothing sidewalls of a MEMS-based silicon X-ray optics

Teppei Moriyama, Yuichiro Ezoe, Tomohiro Ogawa, Takaya Ohashi, Ikuyuki Mitsuishi, Makoto Mita, Kazuhisa Mitsuda, Yoshiaki Kanamori, Akio Maeda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high performance optical systems. A silicon optics was fabricated using dry etching and annealing technologies. An angular resolution evaluated in the X-ray wavelength range was about 20 arcmin in full width half maximum, corresponding to 3.1 mm. In this paper, to achieve a better angular resolution, the silicon dry etching and annealing processes are conditioned. The surface roughness of sidewalls were measured at a 100 μm scale. After the conditionings, it has been improved by a factor of four.

Original languageEnglish
Title of host publicationProceedings - OMN2011
Subtitle of host publication16th International Conference on Optical MEMS and Nanophotonics
Pages205-206
Number of pages2
DOIs
Publication statusPublished - 2011 Dec 12
Event16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey
Duration: 2011 Aug 82011 Aug 11

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Other

Other16th International Conference on Optical MEMS and Nanophotonics, OMN2011
CountryTurkey
CityIstanbul
Period11/8/811/8/11

Keywords

  • DRIE
  • X-ray
  • optics
  • space mission

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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