Abstract
The characteristics of the UHF (Ultra-High-Frequency) plasma and SiO 2 etching with this plasma source were investigated. A study on the optical emission spectroscopy shows that the plasma abounded in CF 2 radicals, which indicates that the degree of the dissociation of feed gas is low. The ion saturation current density shows low dependence on pressure. The etching characteristics, such as SiO 2 etch rate and RIE lag, also show low dependence on pressure. There is no significant effect of pressure on etched profile for a given ion saturation current density, a self-bias voltage and a selectivity of SiO 2 to Photoresist (PR). These characteristics demonstrate that the UHF plasma source can be expected to provide a wide process window for pressure.
Original language | English |
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Pages (from-to) | 150-156 |
Number of pages | 7 |
Journal | NEC Research and Development |
Volume | 38 |
Issue number | 2 |
Publication status | Published - 1997 Dec 1 |
Externally published | Yes |
Keywords
- Etched profile
- Ion saturation current density
- Optical emission spectrum
- Pressure dependence
- RIE lag
- SiO etching
- UHF (Ultra-High-Frequency) plasma source
ASJC Scopus subject areas
- Electrical and Electronic Engineering